Technology  >  Surface Engineering  >  Plasma Assisted ChemicalVapor Deposition

Plasma Assisted Chemical Vapor Deposition (PACVD) is used to deposit extremely smooth, well adhered Amorphous Diamond-Like Carbon (ADLC) coatings in a high vacuum environment at temperatures below 200กใ C. The process is characterized by a high throwing power and no solid target or cathode is used as is the case for the PVD process. In addition, parts do not need to be rotated in the chamber. It is a clean, reliable, high technology coating process. The PACVD process is sometimes referred to PECVD where the "E" stands for "enhanced."

Process Temperature
The typical process temperature for PACVD coatings is under 200กใ C, meaning a wide range of materials can be coated.

Items Typically Coated
The PACVD process is capable of depositing coatings on a very broad range of substrates. PACVD coatings can be deposited on both conductive and insulating materials. Common applications include engine and machine components, pump parts, medical devices and decorative items.

Coatings Typically Deposited
PACVD process is able to deposit a range of ADLC coatings designed for specific application environments including variants for high precision applications, a low-stress version and a version for ceramics.

The coatings are amorphous in structure and contain around 70% sp3 bondings, which accounts for the high hardness of the coating (10-40 GPa).

The coating thickness is generally 2 to 3 microns which is deposited in a typical cycle time of around 3.5 hours.

Advantages of the process:
    •   Flexibility in terms of acceptable substrate materials
    •   Short cycle times / high productivity
    •   The low to moderate coating temperatures means parts maintain their geometry and tolerances
    •   Excellent coating uniformity on a range of geometries (not a line-of-sight process)
    •   The process is environmentally friendly
    •   Possible to coat certain inner diameters